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Properties of GeTe

Properties of GeTe (Germanium telluride):

Compound NameGermanium telluride
Chemical FormulaGeTe
Molar Mass200.24 g/mol

Chemical structure
GeTe (Germanium telluride) - Chemical structure
Lewis structure
3D molecular structure
Physical properties
Appearancesolid
Density6.1400 g/cm³
Helium 0.0001786
Iridium 22.562
Melting725.00 °C
Helium -270.973
Hafnium carbide 3958

Elemental composition of GeTe
ElementSymbolAtomic weightAtomsMass percent
GermaniumGe72.64136.2765
TelluriumTe127.60163.7235
Mass Percent CompositionAtomic Percent Composition
Ge: 36.28%Te: 63.72%
Ge Germanium (36.28%)
Te Tellurium (63.72%)
Ge: 50.00%Te: 50.00%
Ge Germanium (50.00%)
Te Tellurium (50.00%)
Mass Percent Composition
Ge: 36.28%Te: 63.72%
Ge Germanium (36.28%)
Te Tellurium (63.72%)
Atomic Percent Composition
Ge: 50.00%Te: 50.00%
Ge Germanium (50.00%)
Te Tellurium (50.00%)
Identifiers
CAS Number12025-39-7
SMILES[Ge]=[Te]
Hill formulaGeTe

Related
Molecular weight calculator
Oxidation state calculator

Germanium Telluride (GeTe): Chemical Compound

Scientific Review Article | Chemistry Reference Series

Abstract

Germanium telluride (GeTe) represents an important IV-VI semiconductor compound with the chemical formula GeTe and molar mass of 200.21 grams per mole. This material exhibits semimetallic conduction characteristics and demonstrates ferroelectric behavior below its Curie temperature of approximately 670 Kelvin. Germanium telluride crystallizes in a rhombohedral structure with lattice parameters a = 4.1719 Å and c = 10.710 Å, forming a unit cell volume of 161.430 ų. The compound possesses a direct band gap of 0.6 electronvolts and a density of 6.14 grams per cubic centimeter. Germanium telluride undergoes reversible phase transitions between amorphous and crystalline states with resistivity differences up to six orders of magnitude, making it particularly valuable for phase-change memory applications. The material finds extensive utilization in non-volatile optical data storage technologies and shows promise for radio frequency switching applications due to its rapid crystallization kinetics and excellent cyclability.

Introduction

Germanium telluride constitutes an inorganic compound belonging to the class of chalcogenide materials, specifically categorized as a telluride of germanium. This compound occupies a significant position in materials science due to its unique combination of semiconducting and ferroelectric properties. The material demonstrates particular importance in modern technology as a component of chalcogenide glass systems and as a fundamental phase-change material for data storage applications. Germanium telluride exists in multiple crystalline polymorphs, with the room-temperature α-phase exhibiting rhombohedral symmetry and the high-temperature β-phase adopting a cubic rocksalt-type structure. The compound's ability to undergo rapid and reversible phase transitions between amorphous and crystalline states under thermal activation provides the fundamental mechanism for its technological applications in memory devices and switching systems.

Molecular Structure and Bonding

Molecular Geometry and Electronic Structure

Germanium telluride crystallizes in a rhombohedral structure with space group R3m (No. 160) at room temperature, belonging to the Pearson symbol hR6. The unit cell parameters measure a = 4.1719 Å and c = 10.710 Å, resulting in a unit cell volume of 161.430 ų. This structure represents a distorted rocksalt arrangement where germanium and tellurium atoms occupy alternating positions in the lattice. The rhombohedral distortion arises from the ferroelectric displacement of germanium atoms along the [111] direction, creating a permanent electric dipole moment. The electronic structure of germanium telluride exhibits characteristics of a narrow-gap semiconductor with a direct band gap of 0.6 electronvolts. The valence band maximum derives primarily from tellurium 5p orbitals hybridized with germanium 4p orbitals, while the conduction band minimum consists predominantly of germanium 4s and 4p states.

Chemical Bonding and Intermolecular Forces

The chemical bonding in germanium telluride demonstrates predominantly covalent character with partial ionic contribution due to the electronegativity difference between germanium (2.01) and tellurium (2.1). The bonding arrangement follows the octet rule with germanium adopting oxidation state +2 and tellurium -2, though the actual charge distribution shows significant covalency. The interatomic distance between germanium and tellurium measures approximately 2.83 Å in the rhombohedral phase, with bond angles deviating from ideal tetrahedral or octahedral values due to the structural distortion. The intermolecular forces in solid germanium telluride consist primarily of van der Waals interactions between adjacent layers of the structure, though these are considerably stronger than in typical layered compounds due to the three-dimensional nature of the bonding network. The compound exhibits significant dipole-dipole interactions resulting from the ferroelectric displacement of atoms.

Physical Properties

Phase Behavior and Thermodynamic Properties

Germanium telluride manifests three distinct crystalline phases: the room-temperature α-phase (rhombohedral), the γ-phase (orthorhombic), and the high-temperature β-phase (cubic rocksalt-type). The α-phase undergoes a ferroelectric phase transition to the β-phase at approximately 670 Kelvin, which represents the Curie temperature. The melting point occurs at 998 Kelvin (725 °C), with the liquid phase exhibiting metallic conductivity. The density of crystalline germanium telluride measures 6.14 grams per cubic centimeter at room temperature. The refractive index reaches approximately 5.0 for crystalline material, though this value varies significantly between amorphous and crystalline states. The specific heat capacity at room temperature measures approximately 0.21 joules per gram per Kelvin, while the thermal conductivity ranges between 2.0 and 4.0 watts per meter per Kelvin depending on crystallinity and doping.

Spectroscopic Characteristics

Raman spectroscopy of germanium telluride reveals characteristic vibrational modes associated with its rhombohedral structure. The A1 mode appears at approximately 88 reciprocal centimeters, while the E mode manifests at around 120 reciprocal centimeters. These vibrational frequencies shift significantly upon phase transition to the cubic structure. Infrared spectroscopy demonstrates strong absorption in the mid-infrared region due to free carrier absorption in heavily doped samples. Ultraviolet-visible spectroscopy shows an absorption edge corresponding to the direct band gap of 0.6 electronvolts, with additional features arising from interband transitions at higher energies. X-ray photoelectron spectroscopy confirms the presence of germanium in the +2 oxidation state with binding energies of 1217.0 electronvolts for Ge 2p3/2 and 32.5 electronvolts for Ge 3d, while tellurium 3d5/2 peaks appear at 572.5 electronvolts.

Chemical Properties and Reactivity

Reaction Mechanisms and Kinetics

Germanium telluride demonstrates relative stability under ambient conditions but undergoes oxidation upon exposure to atmospheric oxygen and moisture over extended periods. The oxidation process follows parabolic kinetics with an activation energy of approximately 85 kilojoules per mole, resulting in the formation of germanium dioxide and tellurium dioxide surface layers. The compound exhibits resistance to most acids at room temperature but dissolves readily in oxidizing acids such as nitric acid and aqua regia. Reaction with halogens proceeds rapidly at elevated temperatures, forming germanium tetrahalides and tellurium tetrahalides. The thermal decomposition of germanium telluride occurs above 1000 Kelvin through sublimation rather than decomposition, maintaining the GeTe stoichiometry in the vapor phase. The crystallization kinetics of amorphous germanium telluride follow Johnson-Mehl-Avrami kinetics with an Avrami exponent of approximately 3.0, indicating three-dimensional growth with constant nucleation rate.

Acid-Base and Redox Properties

Germanium telluride exhibits amphoteric character in its chemical behavior. The compound demonstrates limited solubility in non-oxidizing acids but undergoes dissolution in basic solutions containing oxidizing agents. The standard reduction potential for the GeTe/Ge + Te couple measures approximately -0.15 volts relative to the standard hydrogen electrode, indicating moderate stability against reduction. Oxidation potentials for germanium telluride fall in the range of +0.5 to +0.8 volts depending on pH, with the compound serving as a mild reducing agent under strongly oxidizing conditions. The material maintains stability across a pH range of 3 to 11 in non-complexing aqueous environments, beyond which dissolution or oxidation processes become significant. The electrochemical behavior shows n-type character in most electrolyte systems due to the inherent p-type conductivity of the material arising from germanium vacancies.

Synthesis and Preparation Methods

Laboratory Synthesis Routes

Laboratory synthesis of germanium telluride typically employs direct combination of the elements in stoichiometric proportions. The reaction proceeds according to the equation Ge + Te → GeTe, conducted under inert atmosphere or vacuum conditions to prevent oxidation. The process involves heating high-purity germanium and tellurium metals in evacuated quartz ampoules to temperatures between 950 and 1000 Kelvin for several hours, followed by slow cooling to facilitate crystallization. Alternative synthetic routes include chemical vapor transport using iodine as transporting agent, which enables growth of single crystals with dimensions up to several millimeters. Solution-based methods utilize germanium(II) precursors such as germanium(II) chloride-1,4-dioxane complex reacted with trioctylphosphine-tellurium in high-boiling solvents like 1,2-dichlorobenzene or phenyl ether. These solution methods produce nanocrystalline material with controlled size distributions, particularly valuable for quantum confinement studies.

Industrial Production Methods

Industrial production of germanium telluride employs scaled versions of the direct combination method, utilizing large furnaces with precise temperature control and atmosphere regulation. The process typically involves mixing stoichiometric quantities of germanium and tellurium powders, pressing into pellets, and sintering in hydrogen or vacuum atmosphere at 950-1000 Kelvin for 10-15 hours. The resulting material undergoes crushing, grinding, and purification through zone refining or sublimation techniques to achieve desired purity levels. Industrial grade germanium telluride maintains purity levels exceeding 99.999% for electronic applications, with particular attention to controlling oxygen and carbon impurities below 5 parts per million. Production capacity for high-purity germanium telluride reaches several metric tons annually worldwide, with major manufacturing facilities located in Germany, Japan, and the United States. The production cost for electronic grade material typically ranges between $500 and $1000 per kilogram depending on purity specifications.

Analytical Methods and Characterization

Identification and Quantification

X-ray diffraction provides the primary method for identification and structural characterization of germanium telluride, with the rhombohedral phase exhibiting characteristic reflections at d-spacings of 3.21 Å (012), 2.16 Å (104), and 1.78 Å (024). Quantitative phase analysis utilizes Rietveld refinement methods with accuracy better than 2% for phase composition determination. Energy-dispersive X-ray spectroscopy enables elemental quantification with detection limits of approximately 0.5 atomic percent for major constituents. Inductively coupled plasma mass spectrometry achieves parts-per-billion detection limits for impurity elements including sodium, potassium, calcium, and transition metals. Electrical characterization through Hall effect measurements determines carrier concentration and mobility, with typical values of 1020-1021 per cubic centimeter and 20-50 square centimeters per volt per second respectively for undoped material.

Purity Assessment and Quality Control

Purity assessment of germanium telluride employs glow discharge mass spectrometry for detection of metallic impurities at sub-parts-per-million levels. Carbon and oxygen content determination utilizes combustion analysis with detection limits of 2 parts per million and 5 parts per million respectively. Electrical quality control specifications typically require resistivity values between 1.0 and 5.0 milliohm-centimeters for crystalline material, with higher values indicating possible contamination or non-stoichiometry. Optical quality material for infrared applications must exhibit absorption coefficients below 2.0 per centimeter at wavelengths of 10.6 micrometers. Crystalline perfection evaluation through etch pit density measurements requires values below 1000 per square centimeter for device-grade material. Phase-change characteristics for memory applications demand crystallization temperatures between 450 and 500 Kelvin with crystallization times shorter than 50 nanoseconds for amorphous to crystalline transition.

Applications and Uses

Industrial and Commercial Applications

Germanium telluride finds extensive application in non-volatile memory technologies, particularly in phase-change random access memory (PCRAM) devices. The compound serves as the active material in rewritable optical storage media including CDs, DVDs, and Blu-ray discs, where its rapid crystallization kinetics and high optical contrast between amorphous and crystalline states enable high-density data storage. Commercial utilization extends to radio frequency switching applications, where thin films of germanium telluride provide the switching medium in micromachined devices for telecommunications systems. The compound functions as a thermoelectric material in intermediate temperature range applications (400-700 Kelvin), with thermoelectric figure of merit ZT values reaching 1.8 in optimized compositions. Infrared optical components utilize germanium telluride for lenses and windows in the 3-12 micrometer wavelength range due to its high refractive index and transmission characteristics.

Research Applications and Emerging Uses

Research applications of germanium telluride focus on its ferroelectric and topological properties. The material serves as a model system for studying ferroelectric phase transitions in semiconductors, particularly the interplay between ferroelectricity and electronic structure. Investigations of germanium telluride nanostructures, including nanowires and nanocrystals, explore quantum confinement effects on ferroelectric properties and phase transition behavior. Emerging applications include neuromorphic computing devices that utilize the analog resistance switching characteristics of germanium telluride for synaptic weight implementation. Research on heterostructures combining germanium telluride with topological insulators examines interface effects on spin-polarized transport properties. The compound's potential as a catalyst for electrochemical reactions, particularly hydrogen evolution and oxygen reduction, represents an active area of investigation due to its tunable electronic structure and surface properties.

Historical Development and Discovery

The investigation of germanium telluride began in the mid-20th century alongside the development of semiconductor science. Initial studies in the 1950s focused on its structural and electrical properties, revealing the semiconducting behavior and narrow band gap. The discovery of its ferroelectric properties occurred in the 1960s through detailed structural studies that identified the rhombohedral distortion and temperature-dependent phase transition. The application of germanium telluride in phase-change memory technology emerged from pioneering work by Yamada and colleagues in 1987, who demonstrated its superior performance compared to earlier tellurium-based alloys. The development of nanoscale synthesis methods in the early 2000s enabled investigation of quantum size effects and low-dimensional properties. Recent advances in thin film deposition techniques have facilitated the integration of germanium telluride into silicon-based microelectronic devices, opening new possibilities for non-volatile memory and reconfigurable electronics.

Conclusion

Germanium telluride represents a multifunctional material with unique combination of semiconducting, ferroelectric, and phase-change properties. The compound's rhombohedral crystal structure with ferroelectric distortion provides the foundation for its distinctive electronic and optical characteristics. The reversible phase transition between amorphous and crystalline states with enormous resistivity contrast enables numerous technological applications in data storage and switching devices. Ongoing research continues to reveal new aspects of germanium telluride's behavior, particularly at nanoscale dimensions where quantum confinement effects modify its fundamental properties. Future developments likely will focus on optimizing the material for energy applications including thermoelectric conversion and electrochemical catalysis, as well as advancing its implementation in neuromorphic computing systems. The compound's rich chemistry and physics ensure its continued importance in both fundamental research and technological applications for the foreseeable future.

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