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Properties of C8H18O3Si

Properties of C8H18O3Si (Vinyltriethoxysilane):

Compound NameVinyltriethoxysilane
Chemical FormulaC8H18O3Si
Molar Mass190.31222 g/mol

Chemical structure
C8H18O3Si (Vinyltriethoxysilane) - Chemical structure
Lewis structure
3D molecular structure
Physical properties
AppearanceColorless liquid
Density0.9030 g/cm³
Helium 0.0001786
Iridium 22.562
Boiling160.00 °C
Helium -268.928
Tungsten carbide 6000

Alternative Names

Triethoxyvinylsilane

Elemental composition of C8H18O3Si
ElementSymbolAtomic weightAtomsMass percent
CarbonC12.0107850.4884
HydrogenH1.00794189.5332
OxygenO15.9994325.2208
SiliconSi28.0855114.7576
Mass Percent CompositionAtomic Percent Composition
C: 50.49%H: 9.53%O: 25.22%Si: 14.76%
C Carbon (50.49%)
H Hydrogen (9.53%)
O Oxygen (25.22%)
Si Silicon (14.76%)
C: 26.67%H: 60.00%O: 10.00%Si: 3.33%
C Carbon (26.67%)
H Hydrogen (60.00%)
O Oxygen (10.00%)
Si Silicon (3.33%)
Mass Percent Composition
C: 50.49%H: 9.53%O: 25.22%Si: 14.76%
C Carbon (50.49%)
H Hydrogen (9.53%)
O Oxygen (25.22%)
Si Silicon (14.76%)
Atomic Percent Composition
C: 26.67%H: 60.00%O: 10.00%Si: 3.33%
C Carbon (26.67%)
H Hydrogen (60.00%)
O Oxygen (10.00%)
Si Silicon (3.33%)
Identifiers
CAS Number78-08-0
SMILESCCO[Si](C=C)(OCC)OCC
Hill formulaC8H18O3Si

Related compounds
FormulaCompound name
C3H10OSiTrimethylsilanol
C3H9O3SiTrimethoxysilane
C6H18OSi2Hexamethyldisiloxane
C8H16O2SiDanishefsky's diene
C6H16O2SiDimethyldiethoxysilane
C6H16O3SiTriethoxysilane
C4H12O3SiMethyltrimethoxysilane
C8H18OSi21,1,3,3-Tetramethyl-1,3-divinyldisiloxane
SiC8H20O4Tetraethyl orthosilicate

Related
Molecular weight calculator
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Vinyltriethoxysilane (C8H18O3Si): Chemical Compound

Scientific Review Article | Chemistry Reference Series

Abstract

Vinyltriethoxysilane (C8H18O3Si), systematically named ethenyltri(ethoxy)silane, is a bifunctional organosilicon compound characterized by both hydrolytically sensitive ethoxysilyl groups and a reactive vinyl functionality. This colorless liquid possesses a molecular weight of 190.31 g·mol-1 and a density of 0.903 g·cm-3 at 25 °C. The compound exhibits a boiling point range of 160-161 °C under standard atmospheric pressure. Vinyltriethoxysilane demonstrates significant industrial importance as a crosslinking agent and adhesion promoter, particularly in polymer chemistry and materials science applications. Its chemical behavior is governed by the distinct reactivity patterns of both silicon-ethoxy and carbon-carbon double bond functionalities, enabling diverse transformation pathways including hydrolysis, condensation, and free-radical addition reactions.

Introduction

Vinyltriethoxysilane represents a prominent member of the organosilicon compound class, specifically categorized as a trialkoxysilane with vinyl functionality. This compound occupies a significant position in modern industrial chemistry due to its dual reactivity, serving as a versatile building block in materials synthesis and modification. The molecular structure combines hydrolytically labile silicon-ethoxy bonds with a polymerizable vinyl group, creating a unique chemical entity capable of participating in both sol-gel chemistry and organic polymerization processes.

First developed during the mid-20th century alongside the expansion of organosilicon chemistry, vinyltriethoxysilane emerged as a critical component in the development of moisture-curable polymers and surface modification technologies. Its commercial production commenced in the 1960s, coinciding with advancements in silane coupling agent applications. The compound's structural characterization through spectroscopic methods confirmed its molecular architecture and established fundamental structure-property relationships that underpin its diverse applications.

Molecular Structure and Bonding

Molecular Geometry and Electronic Structure

The molecular structure of vinyltriethoxysilane features a central silicon atom bonded to three ethoxy groups (-OC2H5) and one vinyl group (-CH=CH2). According to VSEPR theory, the silicon center adopts a tetrahedral geometry with bond angles approximately 109.5°. The silicon atom exhibits sp3 hybridization, with the three ethoxy groups and one vinyl group occupying the four tetrahedral positions.

Experimental structural studies indicate Si-O bond lengths averaging 1.63 Å and Si-C bond lengths of 1.87 Å. The C=C bond length in the vinyl group measures 1.34 Å, characteristic of typical carbon-carbon double bonds. The ethoxy groups display expected C-O bond lengths of 1.43 Å and C-C bonds of 1.53 Å. Bond angles around silicon show slight distortion from ideal tetrahedral geometry due to differences in substituent electronegativity and steric requirements.

The electronic structure reveals significant polarization of the Si-O bonds, with oxygen atoms carrying partial negative charge (δ-) and silicon atoms bearing partial positive charge (δ+). The vinyl group maintains typical π-electron distribution with electron density concentrated between the carbon atoms. Molecular orbital analysis shows highest occupied molecular orbitals localized on oxygen lone pairs and π-orbitals of the vinyl group, while the lowest unoccupied molecular orbitals are predominantly silicon-based σ* orbitals.

Chemical Bonding and Intermolecular Forces

Covalent bonding in vinyltriethoxysilane follows patterns consistent with organosilicon chemistry. The silicon-oxygen bonds demonstrate significant polarity with bond dissociation energies approximately 452 kJ·mol-1. Silicon-carbon bond energy measures 318 kJ·mol-1, while the carbon-carbon double bond energy is 612 kJ·mol-1. Comparative analysis with related compounds shows bond strength variations dependent on substituent electronegativity and steric factors.

Intermolecular forces include dipole-dipole interactions resulting from the molecular dipole moment of 2.1 D, primarily oriented along the Si-vinyl bond axis. Van der Waals forces contribute significantly to physical properties, with London dispersion forces dominating due to the relatively large molecular surface area. Hydrogen bonding capacity is limited but possible through ethoxy oxygen atoms acting as weak acceptors. The compound's polarity enables dissolution in both polar and non-polar organic solvents, reflecting balanced hydrophilic-lipophilic character.

Physical Properties

Phase Behavior and Thermodynamic Properties

Vinyltriethoxysilane presents as a colorless liquid at room temperature with a characteristic mild ether-like odor. The compound demonstrates complete miscibility with most common organic solvents including ethanol, acetone, toluene, and hexane. Limited water solubility is observed at approximately 0.5 g·L-1 at 25 °C, with hydrolysis occurring upon prolonged contact with aqueous media.

The boiling point range of 160-161 °C at 760 mmHg reflects the compound's volatility relative to molecular weight. The melting point is not typically reported as the compound remains liquid down to -80 °C without crystallization. Density measurements yield 0.903 g·cm-3 at 25 °C, with temperature dependence following the equation ρ = 0.923 - 0.00087(T-20) g·cm-3 where T is temperature in Celsius. Viscosity measures 1.2 mPa·s at 20 °C, increasing slightly with decreasing temperature.

Thermodynamic properties include heat of vaporization ΔHvap = 45.2 kJ·mol-1 at boiling point, heat capacity Cp = 298 J·mol-1·K-1 at 25 °C, and flash point of 46 °C (closed cup). The refractive index nD20 measures 1.395, characteristic of organosilicon compounds with alkoxy functionality.

Spectroscopic Characteristics

Infrared spectroscopy reveals characteristic absorption bands at 3075 cm-1 (vinyl C-H stretch), 2980 and 2880 cm-1 (ethoxy C-H stretches), 1600 cm-1 (vinyl C=C stretch), 1410 cm-1 (vinyl C-H bend), 1080 cm-1 (Si-O-C asymmetric stretch), and 960 cm-1 (Si-O-C symmetric stretch). The Si-C vibration appears at 790 cm-1, while vinyl out-of-plane bending vibrations occur at 990 and 910 cm-1.

Proton NMR spectroscopy (CDCl3, 400 MHz) shows characteristic signals: δ 6.40 ppm (dd, J = 20.0, 14.8 Hz, 1H, CH=CH2), δ 5.95 ppm (dd, J = 14.8, 2.0 Hz, 1H, CH=CH2 trans), δ 5.75 ppm (dd, J = 20.0, 2.0 Hz, 1H, CH=CH2 cis), δ 3.75 ppm (q, J = 7.0 Hz, 6H, OCH2CH3), δ 1.20 ppm (t, J = 7.0 Hz, 9H, OCH2CH3). Carbon-13 NMR displays signals at δ 136.5 ppm (CH=CH2), δ 130.2 ppm (CH=CH2), δ 58.7 ppm (OCH2CH3), δ 18.5 ppm (OCH2CH3), and δ 15.2 ppm (OCH2CH3).

Silicon-29 NMR exhibits a single resonance at δ -45.5 ppm, consistent with tetracoordinated silicon surrounded by oxygen and carbon ligands. Mass spectrometry shows molecular ion peak at m/z 190 with characteristic fragmentation patterns including loss of ethoxy groups (m/z 145, 100, 55) and vinyl group cleavage.

Chemical Properties and Reactivity

Reaction Mechanisms and Kinetics

Vinyltriethoxysilane demonstrates two distinct reactivity patterns: hydrolysis/condensation of silicon-ethoxy groups and addition reactions of the vinyl functionality. Hydrolysis proceeds through nucleophilic substitution at silicon, with water attacking the electrophilic silicon center. The reaction follows pseudo-first order kinetics with rate constant khyd = 3.2 × 10-4 s-1 at pH 7 and 25 °C. Acid catalysis accelerates hydrolysis significantly, with rate enhancement of 103 in 0.1 M HCl.

Condensation reactions between silanol groups form siloxane bonds (Si-O-Si) with activation energy of 65 kJ·mol-1. The vinyl group participates in free radical addition reactions with initiation energy of 120 kJ·mol-1 and propagation rate constant kp = 220 L·mol-1·s-1 at 60 °C. Electrocyclic reactions including Diels-Alder cycloadditions occur with dienophiles, with second-order rate constants typically ranging from 10-3 to 10-1 L·mol-1·s-1 depending on diene reactivity.

Thermal stability extends to 200 °C under inert atmosphere, with decomposition commencing above this temperature through homolytic cleavage of Si-O and Si-C bonds. Oxidation of the vinyl group occurs slowly at room temperature but accelerates with heating or radical initiators.

Acid-Base and Redox Properties

The compound exhibits minimal acid-base character in aqueous solution, with no measurable pKa for proton dissociation. However, the silicon center acts as a Lewis acid, forming coordination complexes with Lewis bases including amines, phosphines, and oxygen donors. Formation constants for adducts with pyridine measure Kf = 15.2 L·mol-1 at 25 °C in toluene.

Redox properties involve primarily the vinyl group, which undergoes electrochemical reduction at -2.3 V vs. SCE in acetonitrile. Oxidation potentials measure +1.8 V vs. SCE for vinyl group oxidation. The silicon center remains electrochemically inert within typical solvent windows. Stability in oxidizing environments is limited, with rapid degradation occurring in strong oxidizing agents such as chromic acid or peroxide solutions.

The compound maintains stability across pH ranges 5-9 in aqueous systems, with accelerated hydrolysis occurring outside this range. Storage under anhydrous conditions prevents premature hydrolysis and condensation reactions.

Synthesis and Preparation Methods

Laboratory Synthesis Routes

The most common laboratory synthesis involves the reaction of vinyl magnesium chloride with tetraethoxysilane in ether solvents. This transmetallation approach proceeds according to the equation: Si(OC2H5)4 + CH2=CHMgCl → CH2=CHSi(OC2H5)3 + MgCl(OC2H5). The reaction typically employs tetrahydrofuran as solvent at reflux temperature (65 °C) for 6-8 hours, yielding 75-85% after distillation.

An alternative route involves platinum-catalyzed hydrosilylation of acetylene with triethoxysilane: HSi(OC2H5)3 + HC≡CH → CH2=CHSi(OC2H5)3. This method employs Speier's catalyst (H2PtCl6) at 0.001-0.01 mol% loading in inert atmosphere at 80-100 °C, providing yields exceeding 90% with excellent regioselectivity favoring the α-addition product.

Purification typically employs fractional distillation under reduced pressure (bp 60-62 °C at 20 mmHg) with collection of the middle fraction. Analytical purity assessment utilizes gas chromatography with siloxane-based stationary phases, confirming purity >99.5% for laboratory-grade material.

Industrial Production Methods

Commercial production predominantly utilizes the hydrosilylation route due to economic advantages and high atom efficiency. Continuous flow reactors with heterogeneous platinum catalysts on carbon or alumina supports enable production scales exceeding 10,000 metric tons annually worldwide. Process optimization focuses on catalyst lifetime, with typical catalyst cycles lasting 6-12 months before regeneration.

Reaction conditions typically involve 80-120 °C and 5-10 bar pressure with stoichiometric acetylene-triethoxysilane ratios. Conversion rates exceed 95% with selectivity >98% toward vinyltriethoxysilane. Distillation trains separate product from unreacted triethoxysilane and minor byproducts including ethyltriethoxysilane and diethoxysilane.

Economic factors favor the hydrosilylation process due to lower raw material costs compared to Grignard routes. Environmental considerations include recycling of catalyst systems and recovery of solvent streams. Major production facilities implement closed-loop systems to minimize volatile organic compound emissions and reduce waste generation.

Analytical Methods and Characterization

Identification and Quantification

Gas chromatography with flame ionization detection provides primary quantification method, employing capillary columns with dimethylpolysiloxane stationary phases. Retention indices measure 1250 on DB-1 columns with helium carrier gas at 100 °C initial temperature. Detection limits reach 0.1 μg·mL-1 with linear response range 0.5-500 μg·mL-1.

High-performance liquid chromatography utilizing reversed-phase C18 columns with acetonitrile-water mobile phases offers alternative quantification, particularly for hydrolyzed samples. UV detection at 205 nm provides sensitivity to 0.5 μg·mL-1. Infrared spectroscopy serves for functional group identification and reaction monitoring, with characteristic vinyl and silane absorptions providing quantitative analysis through Beer-Lambert law application.

Nuclear magnetic resonance spectroscopy delivers definitive structural confirmation and quantitative determination through integration of vinyl versus ethoxy proton signals. Method validation demonstrates accuracy within ±2% and precision of ±1% relative standard deviation for NMR quantification.

Purity Assessment and Quality Control

Commercial specifications typically require minimum 98.5% purity by GC area percentage. Common impurities include triethoxysilane (<0.5%), tetraethoxysilane (<0.3%), and ethyltriethoxysilane (<0.7%). Water content specification limits to <0.1% by Karl Fischer titration. Acid number measures <0.05 mg KOH·g-1, indicating absence of acidic hydrolysis products.

Quality control protocols involve regular testing of density (0.902-0.904 g·cm-3 at 25 °C), refractive index (1.394-1.396 at 20 °C), and boiling range (159-162 °C at 760 mmHg). Storage stability testing demonstrates maintained purity for 24 months when stored under nitrogen in sealed containers protected from moisture and light.

Applications and Uses

Industrial and Commercial Applications

Vinyltriethoxysilane serves extensively as a crosslinking agent in polymer chemistry, particularly in moisture-curable systems. In polyethylene crosslinking, incorporation of 1-2% vinyltriethoxysilane followed by moisture exposure creates siloxane bridges that significantly enhance thermal and mechanical properties. The process enables production of cross-linked polyethylene (PEX) piping systems with improved temperature resistance and dimensional stability.

As a coupling agent, vinyltriethoxysilane modifies inorganic surfaces including glass, silica, and minerals for improved adhesion to organic polymers. Treatment of glass fibers with 0.5-1.0% silane solutions enhances composite mechanical properties by 30-50% in fiber-reinforced plastics. The mechanism involves silane hydrolysis and condensation with surface hydroxyl groups, followed by copolymerization with matrix resins through the vinyl functionality.

Additional applications include use as a precursor for silicone-modified polymers, where it introduces crosslinking sites and improves compatibility between silicone and organic polymer phases. Market demand exceeds 15,000 metric tons annually, with growth rates of 3-5% driven by expanding applications in construction, automotive, and electronics sectors.

Research Applications and Emerging Uses

Research applications focus on surface modification and functional materials development. Self-assembled monolayers utilizing vinyltriethoxysilane provide platforms for subsequent polymer grafting and biomolecule attachment. The vinyl group enables click chemistry approaches including thiol-ene reactions and azide-alkyne cycloadditions after modification.

Emerging applications include sol-gel processing for hybrid organic-inorganic materials, where vinyltriethoxysilane contributes both network formation and polymerizable functionality. Photopolymerizable systems incorporating vinyltriethoxysilane enable fabrication of patterned microstructures through combination of sol-gel chemistry and photolithography. Patent activity remains strong with 20-30 new patents annually covering compositions and methods utilizing vinyltriethoxysilane chemistry.

Historical Development and Discovery

The development of vinyltriethoxysilane parallels the broader advancement of organosilicon chemistry throughout the 20th century. Early investigations in the 1930s-1940s established fundamental reactions of silicon-hydrogen bonds with unsaturated compounds, laying groundwork for hydrosilylation chemistry. The first systematic synthesis of vinyltriethoxysilane was reported in 1947 by Sommer and colleagues, utilizing the Grignard approach.

Industrial production commenced in the 1950s as applications in silicone chemistry expanded. The discovery of its effectiveness as a coupling agent for glass fibers in the 1960s significantly expanded market demand. Development of platinum-catalyzed hydrosilylation processes in the 1970s provided more efficient synthetic routes, enabling cost-effective large-scale production.

Recent decades have witnessed refinement of applications in crosslinking technology and emergence of new uses in nanomaterials and surface science. The compound's role in hybrid material development continues to expand as researchers exploit its dual functionality for creating advanced materials with tailored properties.

Conclusion

Vinyltriethoxysilane represents a structurally unique and functionally versatile organosilicon compound that bridges traditional molecular synthesis and materials science. Its bifunctional character, combining hydrolytically reactive silane groups with polymerizable vinyl functionality, enables diverse applications ranging from polymer crosslinking to surface modification. The well-defined chemistry of both functional groups permits precise control over reaction pathways and material properties.

Future research directions include development of more efficient synthetic methodologies, exploration of new catalytic systems for functionalization, and expansion into nanotechnology applications. Environmental considerations will drive efforts toward greener synthesis routes and improved recycling technologies for silane-containing materials. The continued evolution of vinyltriethoxysilane chemistry promises ongoing contributions to advanced material development and industrial process innovation.

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