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Properties of SF6

Properties of SF6 (Sulfur hexafluoride):

Compound NameSulfur hexafluoride
Chemical FormulaSF6
Molar Mass146.0554192 g/mol

Chemical structure
SF6 (Sulfur hexafluoride) - Chemical structure
Lewis structure
3D molecular structure
Physical properties
AppearanceColorless gas
Odorodorless
Solubility0.03 g/100mL
Density0.0062 g/cm³
Helium 0.0001786
Iridium 22.562
Melting-50.70 °C
Helium -270.973
Hafnium carbide 3958
Boiling-68.25 °C
Helium -268.928
Tungsten carbide 6000
Thermochemistry
Heat Capacity97.00 J/(mol·K)
Boron nitride 19.7
Hentriacontane 912
Enthalpy of Formation-120.00 kJ/mol
Adipic acid -994.3
Tricarbon 820.06
Standard Entropy292.00 J/(mol·K)
Ruthenium(III) iodide -247
Chlordecone 764

Alternative Names

Elagas
Esaflon
Sulfur(VI) fluoride
Sulfuric fluoride
Hexafluoro-λ6-sulfane

Elemental composition of SF6
ElementSymbolAtomic weightAtomsMass percent
SulfurS32.065121.9540
FluorineF18.9984032678.0460
Mass Percent CompositionAtomic Percent Composition
S: 21.95%F: 78.05%
S Sulfur (21.95%)
F Fluorine (78.05%)
S: 14.29%F: 85.71%
S Sulfur (14.29%)
F Fluorine (85.71%)
Mass Percent Composition
S: 21.95%F: 78.05%
S Sulfur (21.95%)
F Fluorine (78.05%)
Atomic Percent Composition
S: 14.29%F: 85.71%
S Sulfur (14.29%)
F Fluorine (85.71%)
Identifiers
CAS Number2551-62-4
SMILESFS(F)(F)(F)(F)F
Hill formulaF6S

Related compounds
FormulaCompound name
SF4Sulfur tetrafluoride
SF2Sulfur difluoride
SF7Sulfur heptafluoride
SF5Sulfur pentafluoride
SF3Sulfur trifluoride
S2F2Disulfur difluoride
S3F41,3-Difluoro-trisulfane-1,1-difluoride
S2F4Difluorodisulfanedifluoride
S2F10Disulfur decafluoride

Sample reactions for SF6
EquationReaction type
SF6 + SO3 = SO2F2synthesis
SF6 = S + F2decomposition

Related
Molecular weight calculator
Oxidation state calculator

Sulfur Hexafluoride (SF₆): Chemical Compound

Scientific Review Article | Chemistry Reference Series

Abstract

Sulfur hexafluoride (SF₆) is an inorganic compound with the chemical formula SF₆. This colorless, odorless, nonflammable gas exhibits exceptional chemical inertness and physical properties that make it valuable for specialized industrial applications. The compound possesses a regular octahedral geometry with six fluorine atoms symmetrically arranged around a central sulfur atom. SF₆ demonstrates a density of 6.17 g/L at standard temperature and pressure, approximately five times greater than air. Its most significant application involves serving as a dielectric medium in high-voltage electrical equipment, where it prevents electrical arcing and equipment failure. The compound sublimes at -63.8°C and melts only under pressure at -50.8°C. Despite its chemical stability, SF₆ represents a potent greenhouse gas with a global warming potential 23,900 times that of carbon dioxide over a 100-year timeframe. Atmospheric concentrations have increased from pre-industrial levels below 0.04 parts per trillion to contemporary levels exceeding 12 parts per trillion.

Introduction

Sulfur hexafluoride represents a significant compound in both industrial chemistry and atmospheric science due to its unique combination of physical properties and environmental impact. Classified as an inorganic compound and more specifically as a binary fluoride of sulfur, SF₆ was first synthesized in 1901 by French chemists Henri Moissan and Paul Lebeau through the direct combination of elemental sulfur and fluorine. The compound's exceptional stability arises from both thermodynamic and kinetic factors, including strong sulfur-fluorine bonds and steric protection of the sulfur center by six fluorine atoms. Industrial production began in the mid-20th century, primarily driven by the electrical industry's need for superior insulating materials. SF₆ belongs to the hexafluoride family of compounds, which includes selenium hexafluoride (SeF₆) and tellurium hexafluoride (TeF₆), though it exhibits greater chemical stability than these heavier analogues. The compound's atmospheric lifetime exceeds 3,000 years, making it essentially permanent once released into the environment.

Molecular Structure and Bonding

Molecular Geometry and Electronic Structure

Sulfur hexafluoride exhibits perfect octahedral symmetry (Oh point group) with identical sulfur-fluorine bond lengths of 1.56 Å. According to valence shell electron pair repulsion (VSEPR) theory, the six bonding pairs of electrons arrange themselves symmetrically around the central sulfur atom to minimize electron pair repulsion, resulting in F-S-F bond angles of exactly 90° and 180°. The sulfur atom utilizes sp³d² hybridization, with its valence electron configuration expanding to accommodate six covalent bonds. The molecular orbital description involves formation of six equivalent S-F σ bonds through overlap of sulfur sp³d² hybrid orbitals with fluorine 2p orbitals. Spectroscopic evidence, particularly from X-ray crystallography and electron diffraction studies, confirms the highly symmetric structure. The compound represents a classic example of a hypervalent molecule, with sulfur formally exceeding the octet rule by accommodating twelve electrons in its valence shell.

Chemical Bonding and Intermolecular Forces

The sulfur-fluorine bonds in SF₆ exhibit predominantly covalent character with bond dissociation energy of approximately 379 kJ/mol. Comparative analysis with related fluorides shows this bond strength exceeds that in SF₄ (326 kJ/mol) but falls slightly below that in SO₂F₂ (410 kJ/mol). The high electronegativity difference between sulfur (2.58) and fluorine (3.98) creates polar covalent bonds with calculated ionic character of approximately 30%. Despite bond polarity, the molecular symmetry results in complete cancellation of individual bond dipoles, yielding a net dipole moment of 0 D. Intermolecular forces consist exclusively of weak London dispersion forces due to the nonpolar nature and high symmetry of the molecule. The absence of permanent dipole moments and hydrogen bonding capability contributes to the low boiling point and high volatility observed. Van der Waals radius of the SF₆ molecule measures approximately 3.0 Å, with a calculated molecular volume of 113 ų.

Physical Properties

Phase Behavior and Thermodynamic Properties

Sulfur hexafluoride exists as a colorless, odorless gas at standard temperature and pressure with density of 6.17 g/L. The compound sublimes at -63.8°C under atmospheric pressure but melts at -50.8°C when subjected to pressures exceeding 2.26 bar. The triple point occurs at -50.7°C and 2.26 bar, while the critical point is observed at 45.51°C and 3.749 MPa. Solid SF₆ crystallizes in an orthorhombic structure with space group Oh and unit cell parameters a = 9.33 Å, b = 9.33 Å, and c = 9.33 Å. The heat of fusion measures 5.48 kJ/mol, while the heat of sublimation reaches 21.9 kJ/mol. Specific heat capacity at constant pressure measures 97.28 J·mol⁻¹·K⁻¹ at 25°C. Thermal conductivity values range from 11.42 mW·m⁻¹·K⁻¹ at 0°C to 13.45 mW·m⁻¹·K⁻¹ at 25°C. The compound's viscosity measures 15.23 μPa·s at room temperature, approximately 10% greater than air. The refractive index of gaseous SF₆ is 1.000783 at 589 nm and standard conditions.

Spectroscopic Characteristics

Infrared spectroscopy reveals three fundamental vibrational modes: the ν₁ symmetric stretch at 774 cm⁻¹ (Raman active), the ν₂ symmetric bend at 643 cm⁻¹ (Raman active), and the ν₃ asymmetric stretch at 939 cm⁻¹ (IR active). The ν₄ asymmetric bend appears at 614 cm⁻¹ (IR active). Nuclear magnetic resonance spectroscopy shows a single 19F NMR resonance at -58.5 ppm relative to CFCl₃, consistent with equivalent fluorine atoms. The 33S NMR signal appears at -445 ppm with respect to SO₄²⁻, reflecting the highly symmetric electronic environment. UV-Vis spectroscopy demonstrates no significant absorption above 200 nm, indicating electronic transitions only in the far ultraviolet region. Mass spectrometric analysis shows characteristic fragmentation pattern with base peak at m/z = 127 (SF₅⁺) and molecular ion peak at m/z = 146 (SF₆⁺) with relative abundance of 15%. Other significant fragments include SF₄⁺ (m/z = 108), SF₃⁺ (m/z = 89), and F⁺ (m/z = 19).

Chemical Properties and Reactivity

Reaction Mechanisms and Kinetics

Sulfur hexafluoride demonstrates exceptional chemical inertness under normal conditions, with no significant reactions occurring with water, acids, bases, or oxidizing agents at room temperature. The kinetic stability arises from both the thermodynamic strength of S-F bonds and steric protection of the sulfur atom by six fluorine atoms. Reaction with reducing agents occurs only under extreme conditions; molten lithium metal reduces SF₆ exothermically to lithium sulfide and lithium fluoride at temperatures above 200°C. The compound does not react with molten sodium below its boiling point. Thermal decomposition begins above 500°C, initially forming sulfur tetrafluoride and fluorine. Photochemical decomposition requires vacuum ultraviolet radiation below 160 nm. The hydrolysis rate constant is immeasurably small at pH values between 0 and 14, with estimated half-life exceeding 10,000 years in aqueous environments. Electron capture processes produce the SF₆⁻ radical anion, which undergoes rapid dissociation to SF₅⁻ and F.

Acid-Base and Redox Properties

Sulfur hexafluoride exhibits neither acidic nor basic properties in conventional Brønsted-Lowry or Lewis definitions. The compound does not protonate even with superacids nor deprotonate with strong bases. Redox properties demonstrate extreme oxidation resistance, with no known oxidizing agents capable of further oxidizing sulfur under normal conditions. The standard reduction potential for SF₆/SF₆⁻ couple measures -1.05 V versus standard hydrogen electrode, indicating poor electron affinity. Electrochemical reduction occurs at mercury electrodes at -1.6 V to form SF₅⁻ and fluoride ions. Stability in oxidizing environments remains high, with no reaction observed with ozone, hydrogen peroxide, or potassium permanganate. The compound maintains stability across the entire pH range from concentrated sulfuric acid to concentrated sodium hydroxide solutions.

Synthesis and Preparation Methods

Laboratory Synthesis Routes

Laboratory synthesis typically involves direct combination of elemental sulfur and fluorine gas according to the exothermic reaction: S₈ + 24F₂ → 8SF₆. The reaction proceeds spontaneously at room temperature with ignition, requiring careful control to prevent excessive heat generation. Small-scale preparations often utilize copper vessels as reaction chambers since copper fluoride passivates the surface and prevents further reaction. Alternative synthetic routes include fluorination of sulfur chlorides or oxidation of lower sulfur fluorides. The CoF₃-mediated synthesis proceeds according to: 2CoF₃ + SF₄ → SF₆ + 2CoF₂ at 100-300°C. Purification methods involve fractional distillation to separate SF₆ (bp -63.8°C) from co-produced S₂F₁₀ (bp 29°C) and SF₄ (bp -38°C). Chemical purification utilizes potassium hydroxide scrubbing to remove acidic impurities such as HF and SF₄. Final product typically assays at 99.8% purity with major impurities being air, CF₄, and C₂F₆.

Industrial Production Methods

Industrial production employs direct fluorination of sulfur in specially designed reactor systems. Elemental sulfur melts at 115°C and vaporizes at 445°C, reacting with fluorine gas in stoichiometric excess. Reactors consist of nickel or Monel metal construction with water cooling to control the highly exothermic reaction. Process optimization involves careful control of fluorine-to-sulfur ratio, reaction temperature (200-350°C), and residence time to maximize SF₆ yield while minimizing formation of undesirable byproducts including S₂F₁₀ and SF₄. Global production capacity exceeds 10,000 metric tons annually, with major manufacturing facilities in the United States, China, and Europe. Production costs primarily derive from fluorine generation, which consumes approximately 7 kWh per kilogram of SF₆ produced. Environmental management strategies focus on containment and recycling, with modern facilities achieving 99.5% capture efficiency. Economic analysis indicates production costs ranging from $20-50 per kilogram, with purified product selling for $100-200 per kilogram depending on purity grade.

Analytical Methods and Characterization

Identification and Quantification

Gas chromatography with thermal conductivity detection provides the primary analytical method for SF₆ identification and quantification. Separation employs packed columns containing molecular sieve 5Å or porous polymer beads operated isothermally at 50-100°C. Detection limits reach 0.1 ppm with analysis time under 10 minutes. Infrared spectroscopy offers rapid identification through characteristic absorption at 939 cm⁻¹, with quantitative analysis possible using Beer-Lambert law applications. Gas detection tubes specifically designed for SF₆ provide field screening capability with detection limits of 10 ppm. Mass spectrometric methods achieve the highest sensitivity with detection limits below 1 ppb using selected ion monitoring at m/z = 127 and 146. Chemical ionization techniques using methane reagent gas enhance sensitivity for trace analysis. Atmospheric measurements utilize gas chromatography with electron capture detection, achieving femtomole detection limits necessary for environmental monitoring.

Purity Assessment and Quality Control

Industrial grade SF₆ must meet specifications outlined in ASTM D2472 and IEC 60376 standards. Maximum impurity levels include: moisture < 15 ppmv, air < 25 ppmv, CF₄ < 30 ppmv, and total hydrolyzable fluorides < 0.3 ppmv. Purity assessment employs multiple techniques including Karl Fischer titration for moisture determination, gas chromatography for permanent gas analysis, and infrared spectroscopy for acid fluoride detection. Decomposition product analysis becomes necessary for used SF₆ from electrical applications, with typical specifications requiring SO₂ < 5 ppmv, SOF₂ < 2 ppmv, and S₂F₁₀ < 0.5 ppbv. Quality control protocols involve pressurized sampling into passivated stainless steel cylinders followed by laboratory analysis. Stability testing demonstrates no significant degradation over 10-year storage periods in steel cylinders when maintained at room temperature. Shelf life considerations focus primarily on maintaining container integrity rather than chemical stability.

Applications and Uses

Industrial and Commercial Applications

The electrical power industry represents the largest consumer of SF₆, utilizing approximately 80% of global production as a dielectric medium in high-voltage equipment. Gas-insulated switchgear (GIS) employs SF₆ at pressures of 400-600 kPa to prevent electrical arcing in circuit breakers, disconnectors, and busbars. The dielectric strength measures 89 kV/cm at 690 kPa, approximately three times greater than air at equivalent pressure. The magnesium industry utilizes SF₆ as a protective atmosphere during casting and processing, where it prevents oxidation of molten metal. Typical usage concentrations range from 0.1-1.0% in air or CO₂ mixtures. The semiconductor industry employs SF₆ plasma as a silicon etchant in microelectronics fabrication, particularly for deep reactive-ion etching processes. Plasma decomposition generates fluorine radicals that react isotropically with silicon. Insulated glazing applications utilize SF₆ filling between window panes to improve thermal insulation (thermal conductivity 0.013 W/m·K) and acoustic damping. Market analysis indicates global consumption of 8,000-10,000 metric tons annually, valued at approximately $1 billion.

Research Applications and Emerging Uses

Research applications utilize SF₆ as a tracer gas in atmospheric studies, oceanography, and ventilation efficiency testing due to its detectability at ultratrace levels and absence of natural background sources. Oceanographic studies employ SF₆ to measure diapycnal mixing rates and air-sea gas exchange coefficients at femtomolar concentrations. Medical applications include use as an ultrasound contrast agent through generation of microbubbles that enhance vascular imaging. Ophthalmological procedures employ SF₆ gas tamponade for retinal detachment repair, utilizing the gas's slow absorption rate and buoyant properties. Emerging applications focus on energy storage and conversion systems, particularly in compressed gas insulation for high-voltage direct current transmission. Research continues into alternative dielectric gases with lower global warming potential, though SF₆ remains irreplaceable for certain high-performance applications. Patent analysis shows increasing activity in SF₆ recovery and recycling technologies rather than new application development.

Historical Development and Discovery

Henri Moissan and Paul Lebeau first synthesized sulfur hexafluoride in 1901 during their investigations of fluorine chemistry at the University of Paris. Their initial preparation involved direct reaction of sulfur with fluorine, a method that remains essentially unchanged today. Early characterization work established the compound's molecular weight and chemical inertness. Industrial interest emerged in the 1930s when researchers at General Electric discovered its exceptional dielectric properties. Large-scale production began in the 1950s to support the growing electrical power industry's need for compact, reliable high-voltage equipment. Environmental concerns emerged in the 1970s when measurements detected SF₆ in the atmosphere, though its significance as a greenhouse gas wasn't fully recognized until the 1990s. The 1997 Kyoto Protocol identified SF₆ as one of six greenhouse gases targeted for emission reduction. Technological developments have focused on leakage reduction, recycling methodologies, and alternative gases, though no complete substitutes have been found for all applications. Historical consumption patterns show peak usage in the 1990s followed by stabilization due to improved containment and recycling practices.

Conclusion

Sulfur hexafluoride represents a compound of contrasting characteristics: exceptional chemical stability coupled with significant environmental impact. Its unique combination of dielectric strength, thermal stability, and chemical inertness makes it irreplaceable for certain high-voltage electrical applications. The octahedral molecular structure, with perfect symmetry and strong covalent bonds, provides the fundamental basis for its unusual properties. Environmental considerations have driven substantial improvements in containment, recycling, and emission reduction technologies, though atmospheric concentrations continue to increase slowly. Future research directions include development of alternative dielectric gases with lower global warming potential, improved decomposition methods for spent SF₆, and enhanced recycling methodologies. The compound serves as a case study in balancing technological benefits against environmental impacts, illustrating the complex decisions facing modern industrial chemistry.

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